Wafer Thickness Measurement
Application
Wafer Thickness Measurement can be used for any semiconductor process (front-end/back-end/package…etc.)
Benefits
Wafer Thickness Measurement can control the difference of wafer thickness, and avoid problems which may cause loss to happen through the process.
Specification & Features
- Applied for 8” & 12” Wafer
- Measure Head Measurement Repeatability: ±0.5um
- Robot warpage capability: +6 mm/-6mm
- Applied Wafer Thickness: 430~980um
- 360° Measurement
- Minimum measurement setting angle for 1°
- Machine Measurement Repeatability: ±1um
- Applied for E84 SPEC
- Applied for SECS/GEM SPEC